We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Mask Cleaning Machine.
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Mask Cleaning Machine Product List and Ranking from 5 Manufacturers, Suppliers and Companies

Last Updated: Aggregation Period:Aug 27, 2025~Sep 23, 2025
This ranking is based on the number of page views on our site.

Mask Cleaning Machine Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Aug 27, 2025~Sep 23, 2025
This ranking is based on the number of page views on our site.

  1. カナメックス 厚木工場 Kanagawa//Electronic Components and Semiconductors
  2. TECHNOVISION, INC. main office Saitama//Electronic Components and Semiconductors
  3. サワーコーポレーション Osaka//Industrial Machinery
  4. 4 電子技研 Osaka//Industrial Machinery
  5. 5 特機工業 Osaka//others

Mask Cleaning Machine Product ranking

Last Updated: Aggregation Period:Aug 27, 2025~Sep 23, 2025
This ranking is based on the number of page views on our site.

  1. G8 compatible sheet-type spin large mask cleaning device MSC-1500 カナメックス 厚木工場
  2. Mask Cleaning Machine | Fully Automatic Mask Cleaning Device "TWC-200A" TECHNOVISION, INC. main office
  3. Screen Mask Cleaning Machine SC-A12 サワーコーポレーション
  4. 4 WET process equipment LCD mask cleaning device 電子技研
  5. 5 Photo Mask Cleaning Device | Simple Type Mask Cleaning Device TWC-302 TECHNOVISION, INC. main office

Mask Cleaning Machine Product List

1~7 item / All 7 items

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Screen Mask Cleaning Machine SC-A12

Screen Mask Cleaning Machine SC-A12

The SC-A12 is ideal for cleaning mesh screens used in chip component production. It offers high-speed automatic cleaning from washing to drying in about 4 minutes, and can clean #500 mesh screens as well. It supports two plate sizes: 450mm square and 320mm square. With an option, it can clean both sizes with a single unit.

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  • Ultrasonic Oscillator
  • Other environmental equipment

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Mask Cleaning Machine | Fully Automatic Mask Cleaning Device "TWC-200A"

Complete removal of particles larger than 1μm and resist residue attached to the mask all at once.

The TWC-200A has been specifically developed for the cleaning of masks used in the exposure process. The main feature of this device is its ability to simultaneously and fully automatically remove both resist and particles adhered to the mask. In particular, for resist removal, a dedicated cleaning agent was developed in collaboration with a major chemical manufacturer, significantly improving the removal effectiveness while also considering safety and the global environment. The operator simply needs to place a cassette loaded with the mask. This enhances safety by eliminating exposure to hazardous chemicals and greatly contributes to improving the quality of the exposure process and yield.

  • Other cleaning machines
  • Photomask
  • Other semiconductor manufacturing equipment

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G8 compatible sheet-type spin large mask cleaning device MSC-1500

By using a dedicated chamber for rinsing and drying, precise cleaning is possible.

This is a large mask cleaning device compatible with AGVs, featuring chemical treatment, rinsing, and drying. It also allows for dual-side cleaning due to its reversing mechanism.

  • Other semiconductor manufacturing equipment

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WET process equipment LCD mask cleaning device

The mask is cleaned with a brush and US spray, and dried with high-speed spinning rotation.

The WET process device LCD mask cleaning equipment cleans LCD masks using brushes and ultrasonic spray, and dries them through high-speed spin rotation. The cleaning and spin technologies of Denshi Giken Co., Ltd. can meet the needs of a wide range of industries, including semiconductors, LCDs, medical, and food industries, by cleaning wafers, glass substrates, printed circuit boards, metal substrates, and more. 【Features】 ○ Soft contact with mask substrates through intelligent control ○ Non-contact mask pattern using a mechanical side grip method ○ Double-sided cleaning technology equipped with an automatic mask inversion mechanism ○ Automatic retrieval and storage mechanism from the mask case ○ Scan spray cleaning using ultrasonic nozzles For more details, please contact us or download the catalog.

  • Other cleaning machines
  • Circuit board processing machine

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Photo Mask Cleaning Device | Simple Type Mask Cleaning Device TWC-302

"Scrub washing + rinse" & "Hot pure water drying" two-tank simple mask cleaning device

A simple mask cleaning device that removes particles larger than 1μm attached to masks. It is a two-tank mask cleaning device, where scrubbing cleaning with a dedicated brush and rinsing are performed in the first tank, and hot pure water drying is carried out in the second tank. In the scrubbing cleaning of the first layer, cleaning with a dedicated chemical solution is also offered as an option. Using the dedicated chemical solution makes it possible to remove resist residues.

  • Photomask
  • Other semiconductor manufacturing equipment

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Cleaning device for organic EL display mask

This is a cleaning device that consolidates advanced technology for cleaning masks used in the manufacturing of organic EL displays.

Because it is a completely custom-made product, we can respond to detailed needs. Please consult with us. 【Features】 ○ One device performs all processes of washing, rinsing, and drying. ○ Compatible with various cleaning and rinsing solutions. ○ Low-temperature drying that does not damage masks (in the case of pure water rinse specifications). ○ Precise transport that does not damage masks. ○ Clean room specifications are possible. ○ Equipped with an automatic fire extinguishing system and explosion-proof structure is possible.

  • Other cleaning machines

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Completely custom-made "Organic EL Mask Cleaning Device"

A single machine that completes the cleaning, rinsing, and drying processes! This is an "OLED mask cleaning device" that can be customized to fit the site!

The "Organic EL Mask Cleaning Device" is a cleaning device used to clean metal masks used in the manufacturing of organic EL displays. Since it is fully custom-made, it can be optimized according to usage conditions and environments. One device can perform all cleaning, rinsing, and drying processes, and it features precise transport that does not damage the masks. 【Features】 ■ One device can perform all cleaning, rinsing, and drying processes ■ Compatible with various cleaning and rinsing solutions ■ Low-temperature drying that does not damage the masks ■ Precise transport that does not damage the masks ■ Clean room specifications, equipped with an automatic fire extinguishing system, and explosion-proof structure available *For more details about the "Organic EL Mask Cleaning Device," please contact us directly.

  • Other cleaning machines

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