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Screen Mask Cleaning Machine SC-A12
The SC-A12 is ideal for cleaning mesh screens used in chip component production. It offers high-speed automatic cleaning from washing to drying in about 4 minutes, and can clean #500 mesh screens as well. It supports two plate sizes: 450mm square and 320mm square. With an option, it can clean both sizes with a single unit.
Complete removal of particles larger than 1μm and resist residue attached to the mask all at once.
The TWC-200A has been specifically developed for the cleaning of masks used in the exposure process. The main feature of this device is its ability to simultaneously and fully automatically remove both resist and particles adhered to the mask. In particular, for resist removal, a dedicated cleaning agent was developed in collaboration with a major chemical manufacturer, significantly improving the removal effectiveness while also considering safety and the global environment. The operator simply needs to place a cassette loaded with the mask. This enhances safety by eliminating exposure to hazardous chemicals and greatly contributes to improving the quality of the exposure process and yield.
By using a dedicated chamber for rinsing and drying, precise cleaning is possible.
This is a large mask cleaning device compatible with AGVs, featuring chemical treatment, rinsing, and drying. It also allows for dual-side cleaning due to its reversing mechanism.
The mask is cleaned with a brush and US spray, and dried with high-speed spinning rotation.
The WET process device LCD mask cleaning equipment cleans LCD masks using brushes and ultrasonic spray, and dries them through high-speed spin rotation. The cleaning and spin technologies of Denshi Giken Co., Ltd. can meet the needs of a wide range of industries, including semiconductors, LCDs, medical, and food industries, by cleaning wafers, glass substrates, printed circuit boards, metal substrates, and more. 【Features】 ○ Soft contact with mask substrates through intelligent control ○ Non-contact mask pattern using a mechanical side grip method ○ Double-sided cleaning technology equipped with an automatic mask inversion mechanism ○ Automatic retrieval and storage mechanism from the mask case ○ Scan spray cleaning using ultrasonic nozzles For more details, please contact us or download the catalog.
"Scrub washing + rinse" & "Hot pure water drying" two-tank simple mask cleaning device
A simple mask cleaning device that removes particles larger than 1μm attached to masks. It is a two-tank mask cleaning device, where scrubbing cleaning with a dedicated brush and rinsing are performed in the first tank, and hot pure water drying is carried out in the second tank. In the scrubbing cleaning of the first layer, cleaning with a dedicated chemical solution is also offered as an option. Using the dedicated chemical solution makes it possible to remove resist residues.
